Deposition furnace has Vapor Deposition Furnace and Vacuum Deposition Furnace. Chemical vapor deposition furnace (CVD furnace) is used to heat and gasify metal halides, metal organic compounds, hydrocarbons and other reaction sources on the surface of the target material to generate solid deposits under specific pressure. It is widely used in material purification, new crystal development, various single crystal deposition, polycrystalline or glassy inorganic film materials, etc. Vertical chemical vapor deposition furnace (carbon deposition) has following technical characteristics. Resistance furnace can use multi-temperature zone independent temperature control so that temperature uniformity is good. Besides, it can be controlled by intelligent pressure and small pressure fluctuation.