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Deposition Furnace

Deposition furnace has Vapor Deposition Furnace and Vacuum Deposition Furnace. Chemical vapor deposition furnace (CVD furnace) is used to heat and gasify metal halides, metal organic compounds, hydrocarbons and other reaction sources on the surface of the target material to generate solid deposits under specific pressure. It is widely used in material purification, new crystal development, various single crystal deposition, polycrystalline or glassy inorganic film materials, etc. Vertical chemical vapor deposition furnace (carbon deposition) has following technical characteristics. Resistance furnace can use multi-temperature zone independent temperature control so that temperature uniformity is good. Besides, it can be controlled by intelligent pressure and small pressure fluctuation.

  • Vacuum Sublimation Furnace of Silicon Oxide
    Suitable for mass production of vapor deposition materials such as silicon oxide; High precision temperature difference control, high temperature vacuum furnace; With high vacuum sublimation, reaction, degreasing, dehydration, vapor deposition material automatic grinding scraping, furnace collection and other special process capabilities.
  • Si2o Vapor Deposition Furnace
    Suitable for mass production of vapor deposition materials such as silicon oxide; High precision temperature difference control, high efficiency furnace ; With high vacuum sublimation, reaction, degreasing, dehydration, vapor deposition material automatic grinding scraping, furnace collection and other special process capabilities.
  • Vapor Deposition Furnace
    Vapor deposition furnace can be used to heat and vaporize metal halides, metallic...
  • Vacuum Deposition Furnace
    The Vacuum deposition furnace is used for the preparation of carbon-carbon composite...
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