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Suitable for mass production of vapor deposition materials such as silicon oxide; High precision temperature difference control, high efficiency furnace ; With high vacuum sublimation, reaction, degreasing, dehydration, vapor deposition material automatic grinding scraping, furnace collection and other special process capabilities.
Equipment features:
A large amount of material, high production efficiency.
The whole process is completely closed and automatic operation to avoid dust flying, and the production site environment is clean and tidy.The temperature is controlled within 1500 degrees, and the heating rate is fast.
Can maintain stable operation under vacuum.
Furnace structure | |
Size of constant temperature zone | Φ500mm*600mm ，Φ600mm*800mm ，Φ700mm*1000mm ，Φ800mm*1600mm,etc sizes. (can be customized according to customer needs) |
furnace body | The inner and outer double-layer water cooling structure, and the contact part of the cooling water made of 304 stainless steel, effectively prevent the furnace body for a long time to use gas leakage phenomenon |
Sublimation system | The heating zone is composed of induction coil, heavy corundum, graphite hard felt and isostatic graphite. The collection area is composed of 310S stainless steel and insulation layer. |
temperature control system | Using PLC touch screen centralized control mode, automatic control, with network port, can realize remote control. |
Heating System | Induction heating is adopted, and the power supply is IGBT energy-saving power supply with low noise and about 15% energy saving than the traditional thyristor power supply. |
It is composed of multistage vacuum pump, vacuum valve, pressure controller and pipeline. | |
Cooling System | Equipped with closed cooling system, internal circulation with deionized water, will not cause scaling equipment pipeline, internal circulation water loss is small, external circulation with tap water, automatic water refill, fan start heat dissipation; Good heat dissipation effect, integrated environmental protection, small footprint and so on. |
The equipment is composed of sublimation system, collection system, heating system, temperature control system, vacuum system, mechanical system and cooling system. | |
Advantages
1. High temperature stability: silicon oxide deposition furnace can deposit silicon oxide film at high temperature, with good high temperature stability. This makes it possible to achieve a precise deposition process under high temperature conditions, ensuring the quality and uniformity of the deposited film.
2. Precise temperature control: The silicon oxide deposition furnace is equipped with an advanced temperature control system, which can achieve accurate temperature control. This is very important for the silicon oxide deposition process, because the control of temperature directly affects the properties and quality of the deposited films.
3. High vacuum: The silicon oxide deposition furnace provides a high vacuum environment, which can effectively eliminate oxygen and other impurities. This helps to ensure the purity of the deposition process and avoid the impact of impurities on the properties of the deposited film.
4. Uniform deposition: The silous oxide deposition furnace can achieve uniform deposition to ensure the uniformity of the deposited film. This is important for applications that require high uniformity, such as semiconductors and optoelectronics.
5. Flexibility: silicon oxide deposition stoves have high flexibility and can be adjusted and optimized according to different needs. For example, parameters such as deposition rate and atmosphere control can be adjusted to meet the requirements of different materials and applications.
In summary, the silicon oxide deposition furnace has the advantages of high temperature stability, precise temperature control, high vacuum, uniform deposition and flexibility, making it an ideal device for silicon oxide film deposition.
Welcome clients to email us or call us to consult our products, warmly welcome customers from all over the world to visit our factory, to order us. We can customize equipment according to customer requirements, can stick customer brand, can give customers customized certificates. Any request or questions, pls be free to contact us, thanks!
Suitable for mass production of vapor deposition materials such as silicon oxide; High precision temperature difference control, high efficiency furnace ; With high vacuum sublimation, reaction, degreasing, dehydration, vapor deposition material automatic grinding scraping, furnace collection and other special process capabilities.
Equipment features:
A large amount of material, high production efficiency.
The whole process is completely closed and automatic operation to avoid dust flying, and the production site environment is clean and tidy.The temperature is controlled within 1500 degrees, and the heating rate is fast.
Can maintain stable operation under vacuum.
Furnace structure | |
Size of constant temperature zone | Φ500mm*600mm ，Φ600mm*800mm ，Φ700mm*1000mm ，Φ800mm*1600mm,etc sizes. (can be customized according to customer needs) |
furnace body | The inner and outer double-layer water cooling structure, and the contact part of the cooling water made of 304 stainless steel, effectively prevent the furnace body for a long time to use gas leakage phenomenon |
Sublimation system | The heating zone is composed of induction coil, heavy corundum, graphite hard felt and isostatic graphite. The collection area is composed of 310S stainless steel and insulation layer. |
temperature control system | Using PLC touch screen centralized control mode, automatic control, with network port, can realize remote control. |
Heating System | Induction heating is adopted, and the power supply is IGBT energy-saving power supply with low noise and about 15% energy saving than the traditional thyristor power supply. |
It is composed of multistage vacuum pump, vacuum valve, pressure controller and pipeline. | |
Cooling System | Equipped with closed cooling system, internal circulation with deionized water, will not cause scaling equipment pipeline, internal circulation water loss is small, external circulation with tap water, automatic water refill, fan start heat dissipation; Good heat dissipation effect, integrated environmental protection, small footprint and so on. |
The equipment is composed of sublimation system, collection system, heating system, temperature control system, vacuum system, mechanical system and cooling system. | |
Advantages
1. High temperature stability: silicon oxide deposition furnace can deposit silicon oxide film at high temperature, with good high temperature stability. This makes it possible to achieve a precise deposition process under high temperature conditions, ensuring the quality and uniformity of the deposited film.
2. Precise temperature control: The silicon oxide deposition furnace is equipped with an advanced temperature control system, which can achieve accurate temperature control. This is very important for the silicon oxide deposition process, because the control of temperature directly affects the properties and quality of the deposited films.
3. High vacuum: The silicon oxide deposition furnace provides a high vacuum environment, which can effectively eliminate oxygen and other impurities. This helps to ensure the purity of the deposition process and avoid the impact of impurities on the properties of the deposited film.
4. Uniform deposition: The silous oxide deposition furnace can achieve uniform deposition to ensure the uniformity of the deposited film. This is important for applications that require high uniformity, such as semiconductors and optoelectronics.
5. Flexibility: silicon oxide deposition stoves have high flexibility and can be adjusted and optimized according to different needs. For example, parameters such as deposition rate and atmosphere control can be adjusted to meet the requirements of different materials and applications.
In summary, the silicon oxide deposition furnace has the advantages of high temperature stability, precise temperature control, high vacuum, uniform deposition and flexibility, making it an ideal device for silicon oxide film deposition.
Welcome clients to email us or call us to consult our products, warmly welcome customers from all over the world to visit our factory, to order us. We can customize equipment according to customer requirements, can stick customer brand, can give customers customized certificates. Any request or questions, pls be free to contact us, thanks!
