Vapor Deposition Furnace

Vapor deposition furnace

Vapor deposition furnace can be used to heat and vaporize metal halides, metallic organic compounds, hydrocarbons and other reaction sources under specific pressure to generate solid sediment on the surface of the target material. It is also used for chemical vapor deposition of composite materials with hydrocarbon gas (such as C3H8, etc.) as carbon source, such as C/C composite materials, SiC composite materials, CVD, CVI processing.

Features:

1) At medium or high temperature, solid material is formed and deposited on the matrix through the gas phase chemical reaction between the initial compounds in the gas phase.

2) It can be deposited under atmospheric pressure or vacuum conditions (negative pressure "deposition, usually vacuum deposition film quality is better).

3) The use of plasma and laser assisted technology can significantly promote the chemical reaction, so that the deposition can be carried out at a lower temperature.

4) The chemical composition of the coating can change with the change of the gas phase composition, so as to obtain gradient sediment or mixed coating.

5) Can control the coating density and coating purity.

6) around the plated parts. It can be coated on complex shape matrix and granular material. Suitable for coating all kinds of complex shapes of the workpiece. Because of its good coating performance, it can be coated with grooves, grooves, holes, and even blind holes of the workpiece.

7) The deposited layer usually has a columnar crystal structure and is not resistant to bending, but its structure can be improved by gas phase perturbation of the chemical reaction through various techniques.

8) can form a variety of metal, alloy, ceramic and compound coatings through various reactions.