Vapor deposition furnace is a commonly used film deposition equipment, which grows thin film material on the surface of substrate by vapor deposition technology. It works by transferring a gas or gas mixture to the surface of a heated substrate, causing it to undergo a chemical reaction on the surfa

Because of its high efficiency, precision, flexibility and wide applicability, the vapor deposition furnace occupies an important position in modern industrial production. So as a special industrial equipment, the characteristics of the vapor deposition furnace are mainly manifested in what aspects?

‌ The functions of the vapor deposition furnace mainly include material growth and deposition, heat treatment, film preparation, nanomaterials preparation, semiconductor industry application, powder metallurgy, optical material preparation, etc. ‌Vapor deposition furnace is an important material pre